4. Micro Functional Fabrication Using Ion Implantation
4. Micro Functional Fabrication Using Ion Implantation
Micro functional fabrication techniques using selective ion beam implantation are under development for micromachine technologies.
The implanted area and substrate in silicon show the different etch rates. We fabricated microstructures on silicon substrate by etching after ion implantation using a micropatterned mask. A distinctive three-dimensional structure can be fabricated using different implantation profiles with depth. Furthermore, the modified structure has controlled properties and is applicable to functional microdevices.
In addition, we are studying the effect of a single-ion impact on surfaces. Since an ion is an atom which is basic constituent element of materials, even just one has great influence on surface properties. We found nano-meter size regions which have different friction coefficients and electronic properties caused by single ion irradiation against graphite.
